A study of the formation of water marks from membrane-distilled water and ultrapure water.

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概要

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• Effects of evaporation temperature on the formation of water marks left on a Si wafer were studied using membrane-distilled water and ultrapure water. The main constituent of water marks from membrane-distilled water was found to be liquid hydrocarbon, with some C = C bonds present, and when evaporation velocity was greater than about 20 kg/(m2•h) evaporation could take place without marks formation. Water marks from ultrapure water had a higher boiling point than those from membrane-distilled water and were left on a Si wafer even when the water was evaporated at a velocity of about 20kg/(m2• h).

• 公益社団法人 化学工学会の論文

著者

• EBARA KATSUYA

  Hitachi Research Laboratory, Hitachi Ltd.

• MATSUZAKI HARUMI

  Hitachi Research Laboratory, Hitachi Ltd.

• TAKAHASHI SANKICHI

  Hitachi Research Laboratory, Hitachi Ltd.

• OOKOUCHI ISAO

  Hitachi Research Laboratory, Hitachi Ltd.

• KUROKAWA HIDEAKI

  Hitachi Research Laboratory, Hitachi Ltd.

関連論文

• Relation between pressure loss and collected particle weights in a high gradient magnetic separator (HGMS).
• A study of the formation of water marks from membrane-distilled water and ultrapure water.

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