高周波マグネトロンスパッタ法による BaTiO3/Pt 自立膜の作製と評価
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概要
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BaTiO3 (BTO)/Pt freestanding films were fabricated by depositing BTO on Pt foils using a RF magnetron sputtering method. From the results, we found that the flatness of the Pt foils was affected by that of substrates. Flat and preferentially (111)-oriented Pt foils were obtained by using the MgO substrates. Coercive field and remnant polarization of the BTO/Pt freestanding film were 13 kV/cm and 1.4 μC/cm2, respectively. This was for the first time the report on the deposition of BTO films on the Pt foils, which is called BTO/Pt freestanding film.
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