On Fractal Properties of Equipotentials over a Real Rough Surface Faced to Plasma in Fusion Devices

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概要

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• We consider a sheath region bounded by a corrugated surface of material conductor and a flat boundary held to a constant voltage bias. The real profile of the film deposited from plasma on a limiter in a fusion device was used in numerical solving of the Poisson's equation to find a profile of electrostatic potential. The rough surface influences the equipotential lines over the surface. We characterized a shape of equipotential lines by a fractal dimension. The long-range correlation in the potential field is imposed by the non-trivial fractal structure of the surface. Dust particles bounced in such irregular potential field can accelerate due to the Fermi acceleration.

• 社団法人 プラズマ・核融合学会の論文

著者

• BUDAEV Viacheslav

  Nuclear Fusion Institute, RRC Kurchatov Institute, 123182, Kurchatov Sq.1, Moscow, Russia

• YAKOVLEV Mikhail

  National Institute for Fusion Science, Oroshi 322-6, Toki, Gifu 509-5292, Japan

関連論文

• Scaling Laws of Intermittent Plasma Turbulence in Edge of Fusion Devices
• On Fractal Properties of Equipotentials over a Real Rough Surface Faced to Plasma in Fusion Devices

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