Negative Ion Formation by Thermal Electron Attachment to Nitrous Oxide at Atomospheric Pressure (イオン化特集-続-)
スポンサーリンク
概要
- 論文の詳細を見る
The time profiles of negative ions formed by X-ray irradiation in nitrous oxide at atmospheric pressure have been measured in the temperature range from 256 K to 500 K by using TRAPI. N2O2(N2O)n- ions (0≤n≤8) and N3O2- ions were observed but N2O(N2O)n- ions were not detected. The rates of negative ion formation were almost invariable for the different ionic species at the same temperature. The formation of the negative ions by thermal electron attachment was interpreted by the following processes; N2O↔N2O* (vibrationally excited in bending mode), eth- + N2O-*↔N2O-*, N2O-* + N2O → N2O2- + N2. The apparent activation energy of these processes was obtained to be 0.21 ±0.04 eV. The value of this activation energy corresponds to the excitation energy of the third vibrational level in the bending mode of N2O. The formation of N2O2- ions has been discussed in terms of the distribution of the cluster size (n) in N2O2(N2O)n- ions and the activation energy which is lower than that of the dissociative resonance electron capture in N2O (e- + N2O → O- + N2).
- 日本質量分析学会の論文
著者
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Matsuoka Shingo
Nuclear Engineering Research Laboratory, Faculty of Engineering, University of Tokyo
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Hayakawa S
Univ. Osaka Prefecture Sakai Jpn
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Hayakawa Shigeo
Depertment of Chemistry, College of Integrated Arts and Sciences, University of Osaka Prefecture
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Matsumoto Akira
Depertment of Chemistry, College of Integrated Arts and Sciences, University of Osaka Prefecture
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Yoshioka Masaki
Depertment of Chemistry, College of Integrated Arts and Sciences, University of Osaka Prefecture
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Sugiura Toshio
Depertment of Chemistry, College of Integrated Arts and Sciences, University of Osaka Prefecture
関連論文
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