Study of argon additive in a beam injection type negative ion source using VUV emission spectroscopy
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概要
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Effects of Ar addition are studied by using a beam injection type negative ion source. With adding Ar, I_<H-> increases at low base H_2 pressure. At high base H_2 pressure, however, I_<H-> decreases. VUV emission intensities also decrease at high base pressure. In other words, Ar addition is adverse effect for production of H_2 (v''). Therefore, decrease in I_<H-> is caused by decrease in H_2 (v''). In D_2 plasmas, variation patterns of plasma parameters and VUV intensities by Ar addition are nearly the same as ones in H_2 plasmas. Even in low base pressure, however, enhancement of I_<D-> is not observed.
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Elsevier | 論文
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