MP-10 FIB-CVD三次元ナノ構造形成における下方成長特性の評価(ポスターセッション)

概要

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Focused-ion-beam chemical vapor deposition (FIB-CVD) enables to fabricate the arbitrary three-dimensional (3-D) nanostructure. Most of 3-D nanostructure fabrications have focused on upward or lateral growth whereas few of them focused on downward growth. Therefore, we investigated the downward growth characteristics in order to achieve more arbitrary 3-D nanostructure fabrication in this study. Air nanowires were fabricated by scanning FIB at the different lateral scan speed. The results show that with the increase of the scan speed, the growth volume decreases so that the thickness of nanowire decreases. And the minimum thickness was approximately 53nm. The angle limit of downward growth was approximately -10 degrees, while the growth angle of defective nanowire reached -18 degrees. The downward growth limit is determined by the relationship between structural property and region of secondary electrons emission. And also, we demonstrated the fabrication of the 3-D nanostructure including the downward growth structure by the real-time control of the scan speed. With controlling the downward growth, more various 3-D nanostructures can be fabricated.
一般社団法人日本機械学会の論文
2011-09-25