Device Simulation of Amorphous Indium-Gallium-Zinc-Oxide Thin Film transistors with various interfacial Dielectric layers(Session 6A : TFTs and Sensors)
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概要
- 論文の詳細を見る
In-Ga-Zn-O (IGZO) is a well-known high electron mobility, which has many advantages, such as higher drive current and faster device operating speed. More recently, it is attracting considerable attention for its possible application to thin-film transistors. In this paper, we demonstrate that Woo-Seok Cheong et al. IGZO TFTs was simulated by using the well-known physical model based on the exponential density of deep and tail states [1]. Both I_D-V_<DS> and I_D-V_<GS> curves of the TFTs are fairly well reproduced using the proposed model.
- 2010-06-23
著者
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KIM H.
Division of Advanced Materials Engineering, Kongju National University
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Seong H.
Division of Electrical and Electronics Engineering, Korea Maritime University
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Son J.
Division of Electrical and Electronics Engineering, Korea Maritime University
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Kim W.
Division of Electrical and Electronics Engineering, Korea Maritime University
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Cheong W.
Transparent Display Team Electronics and Telecommunications Research Institute (ETRI)
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Jang N.
Division of Electrical and Electronics Engineering, Korea Maritime University
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Kim H.
Division Of Electrical And Electronics Engineering Korea Maritime University
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Kim H.
Division Of Advanced Materials Engineering Kongju National University
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Kim W.
Division Of Electrical And Electronics Engineering Korea Maritime University
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Son J.
Division Of Electrical And Electronics Engineering Korea Maritime University
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Jang N.
Division Of Electrical And Electronics Engineering Korea Maritime University
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Seong H.
Division Of Electrical And Electronics Engineering Korea Maritime University
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