Deposition of Silicon Compound Thin Films in DC Discharge Plasma using Hydrogen-Hexamethyldisilane Gas Mixture
スポンサーリンク
概要
著者
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Kando M.
Department of Electrical and Electronic Engineering, Shizuoka University, Johoku 3-5-1, Hamamatsu 43
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Yamanashi H.
Yazaki Corporation
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Etoh A.
Department Of Electrical And Electronic Engineering Shizuoka University
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Kanno T.
YAZAKI Corporation
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Kando M.
Department Of Electrical And Electronic Engineering Shizuoka University
関連論文
- Heavy-Particle Hybrid Simulation of a High-Voltage Glow Discharge in Helium
- Deposition of Silicon Compound Thin Films in DC Discharge Plasma using Hydrogen-Hexamethyldisilane Gas Mixture