20916 低真空領域における粒子挙動解析方法の検討(化学反応・複雑流体,一般講演)

概要

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The particle of the film deposition sub-product etc. is one of the factors which leads to the quality decrease in the film deposition device under a low vacuum. The particle behavior analysis is important for the factor analysis. However, the analysis in a low vacuum was difficult although the particle behavior analysis under the atmospheric pressure was possible. In this study, the fluid resistance that is applied on the particle in a low vacuum was revised by the function of pressure, and implication method to general fluid analysis software was examined. The capability to reproduce the falling movement of a particle due to gravity was confirmed by an experiment.
2009-03-05