Effect of the surface of a silicon substrate on the growth of ZnO films by a wet process(<Feature>Aqueous Solution Science for Ceramic Processing II)
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概要
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Effects of a silicon substrate on growth of ZnO in a wet chemical process were investigated. ZnO has been fabricated from base solutions composed of Zn(NO_3)_2, ammonia and polyethylene glycol at low temperatures by a wet chemical process. When a silicone substrate was immersed in the solution, flower-like ZnO was obtained on the substrate from the solution at pH=10.4-10.9. In the case without the substrates, Zn(OH)_2 powders were obtained from the solution at pH=10.4-10.9 and ZnO powders, which were not like flowers, were obtained from solution at pH≤7.6.
- 社団法人日本セラミックス協会の論文
- 2009-03-01
著者
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Hayashi Toshiharu
Central Research Institute Naka Research Center Mitsubishi Materials Corporation
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Yano Tetsuji
Department Of Chemistry And Material Science Tokyo Institute Of Technology
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Shibata Shuichi
Dep. Of Chemistry And Materials Sci. Tokyo Inst. Of Technol.
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Shibata Shuichi
Department Of Chemistry And Material Science Tokyo Institute Of Technology
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SEGAWA Hiroyo
Department of Chemistry and Materials Science Tokyo Institute of Technology
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IZUMI Reiko
Central Research Institute Naka Research Center, Mitsubishi Materials Corporation
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Izumi Reiko
Central Research Institute Naka Research Center Mitsubishi Materials Corporation
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