実験室における地震実験の下での縦衝撃のビルに及ぼす効果

概要

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Model simulations are carried out with photoelastic material in order to examine the effect of vertical impact on building in the case of a near-field earthquake. High-speed photoelastic method combined with semiconductor strain gauges is utilized to observe the direct full field of stress waves in the building due to vertical impact. The experimental conditions under which an earthquake dynamic loading is applied to a model building are derived from the data recorded in the Hanshin-Awaji earthquake. It is found from our experimental results that large stress is produced in the fixed ends of architectural beam by the vertical impact arising from a seismic source located directly below a land.