ディップコーティング法による可視光応答光触媒薄膜の創製とその光分解特性評価
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概要
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The visible light responsive TiO2 thin film photocatalysts were prepared by applyinga dip-coating process, for which the coating solution was prepared using titaniumtetraisopropoxide as a source material and different organic solvents. The nitrogen wasdoped to the obtained TiO2 thin film during the calcination process as an agent forvisible light response. The surface morphology was analyzed by AFM and FE-SEM.Nitrogen state in the lattice and crystalline stricture were measured by XPS and XRD,respectively. Photocatalytic decomposition activity of methylene blue on the films wasalso measured under visible light irradiation using the light emitting diodes.
著者
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堀河 俊英
徳島大学大学院ソシオテクノサイエンス研究部・先進物質材料部門(徳島大学工学部化学応用工学科)
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堀河 俊英
徳島大学大学院ソシオテクノサイエンス研究部先進物質材料部門
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礒田 隆司
徳島大学大学院先端技術科学教育部環境創生工学専攻