Migration of Ion-implanted Fe in Silica Glass during Thermal Treatment
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概要
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Migration of ion-implanted Fe in silica glass and thennally oxidized SiO_2 films during thermal treatment in vacuum was studied by Rutherford backscattering spectrometry (RBS) and transmission electron microscopy (TEM). The Fe migration was observed in directions toward both the surface and deep inside the substrate, and the migration length toward the surface is much shorter than that toward the inside which is consistent with the diffusion length of Fe in silica glass. The Fe migration toward the surface increased with increasing annealing time, whereas it decreased with increasing ion dose. In addition, formation of a-Fe precipitates and their migration toward the surface were found in the near-surface region. However, the mechanism of the migration is still not clear, though a considerable possibility is discussed.
- 社団法人応用物理学会の論文
- 2002-10-15