Patterned Magnetic Permalloy and Nickel Films : Fabrication by Electron Beam and X-Ray Lithographic Techniques
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概要
- 論文の詳細を見る
Electron beam (e-beam) and X-ray lithographic techniques have been used to fabricate permalloy (NisoFe2o) and nickel rectangular and triangular dots and antidots on an area of (1 x 1) mm^2. Dot dimensions and spacings range from 500 urn to 1 μm and from 250 nm to 50 nm, respectively. The changes of the magnetic properties induced by patterning have been studied by means of magneto-optic Kerr effect (MOKE) magnetometry and the Brillouin light scattering (BLS) technique.
- 社団法人応用物理学会の論文
- 2002-08-15
著者
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Fabrizio Enzo
Tasc-infm
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Mastrogiacomo Luigi
Cnr-iess Istituto Di Elettronica Dello Stato Solido
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Cabrini S
Lilit Beam Line National Nanotechnology Laboratory-tasc Istituto Nazionale Per La Fisica Materia (in
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CANDELORO Patrizio
INFM, Dipartimento di Fisica, Universini di Perugi
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GERARDINO Annamaria
CNR -lESS, Istituto di Elettronica dello Stato Solido
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CABRINI Stefano
CNR -lESS, Istituto di Elettronica dello Stato Solido
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GIANNINI Giorgio
CNR-IESS, Istituto di Elettronica dello Stato Solido
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CIRIA Miguel
Department of Materials Science and Engineering, Massachusetts Institute of Technology
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GUBBIOTTI Gianluca
INFM, Dipartimento di Fisica, Universini di Perugi
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CARLOTTI Giovanni
INFM, Dipartimento di Fisica, Universini di Perugi
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Ciria Miguel
Department Of Materials Science And Engineering Massachusetts Institute Of Technology
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Giannini Giorgio
Cnr-iess Istituto Di Elettronica Dello Stato Solido
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Carlotti Giovanni
Infm Dipartimento Di Fisica Universini Di Perugi
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Gubbiotti Gianluca
Infm Dipartimento Di Fisica Universini Di Perugi
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Candeloro P
Inst. Nazionale Per La Fisica Della Materia (infm) At Elettra Trieste Ita
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Gerardino Annamaria
Cnr -less Istituto Di Elettronica Dello Stato Solido
関連論文
- Patterned Magnetic Permalloy and Nickel Films : Fabrication by Electron Beam and X-Ray Lithographic Techniques
- X-Ray Lithography Patterning of Magnetic Materials and Their Characterization