The Atomic-Scale Removal Mechanism during Si Tip Scratching on Si and SiO_2 Surfaces in Aqueous KOH with an Atomic Force Microscope
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概要
- 論文の詳細を見る
- 2002-07-30
著者
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Katsuki Futoshi
Corporate Research And Development Laboratories Sumitomo Metal Industries Limited.
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Katsuki Futoshi
Corporate Research And Development Laboratories Sumitomo Metal Industries Limited
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SAGUCHI Akihiko
Corporate Research and Development Laboratories, Sumitomo Metal Industries Limited
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TAKAHASHI Wataru
Corporate Research and Development Laboratories, Sumitomo Metal Industries Limited
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WATANABE Junji
Graduate School of Science and Technology, Kumamoto University
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Saguchi Akihiko
Electronics Materials & Research Department Electronics Engineering Laboratories Sumitomo Metal
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Watanabe Junji
Graduate School Of Science And Technology Kumamoto University
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Takahashi Wataru
Corporate Research And Development Laboratories Sumitomo Metal Industries Limited
関連論文
- The Atomic-Scale Removal Mechanism during Si Tip Scratching on Si and SiO_2 Surfaces in Aqueous KOH with an Atomic Force Microscope
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