Influence of Substrate Roughness on the Formation of Aliphatic Self-Assembled Monolayers (SAMs) on Silicon(100)
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概要
- 論文の詳細を見る
- 2002-06-30
著者
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More Sam
Department Of Vacuum Uv Photoscience Institute For Molecular Science
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GRAAF Harald
Department of Vacuum UV Photoscience, Institute for Molecular Science
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BAUNE Michael
Institute of Applied Physical Chemistry, AG Chemische Synergetic, Bremen University
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WANG Changshun
Department of Vacuum UV Photoscience, Institute for Molecular Science
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URISUl Tsuneo
Department of Vacuum UV Photoscience, Institute for Molecular Science
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Graaf H
Department Of Vacuum Uv Photoscience Institute For Molecular Science:institute Of Applied Physical C
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Urisul Tsuneo
Department Of Vacuum Uv Photoscience Institute For Molecular Science:the Graduate University For Adv
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Baune Michael
Institute Of Applied Physical Chemistry Ag Chemische Synergetic Bremen University
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Baune Michael
Institut Fur Angewandte Und Physikalische Chemie Ag Chemische Synergetik Universitat Bremen
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Wang Changshun
Department Of Vacuum Uv Photoscience Institute For Molecular Science
関連論文
- Influence of Substrate Roughness on the Formation of Aliphatic Self-Assembled Monolayers (SAMs) on Silicon(100)
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