Dynamics of Mass-Limited Laser Plasma Targets as Sources for Extreme Ultraviolet Lithography

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概要

• 論文の詳細を見る

• The droplet laser plasma source has many attractive features as a continuous, almost debris-free source for extreme ultraviolet (EUV) and X-ray radiation applications. In a combined experimental and theoretical study, we are analyzing the interaction physics between the laser light and microscopic spherical liquid droplet targets over a range of conditions.

• 社団法人応用物理学会の論文
• 2002-06-30

著者

• Keyser Christian

  School Of Optics & Creol University Of Central Florida

• BERNATH Robert

  School of Optics & CREOL, University of Central Florida

• AL-RABBAN Moza

  School of Optics & CREOL, University of Central Florida

• RICHARDSON Martin

  School of Optics & CREOL, University of Central Florida

• Al-rabban Moza

  School Of Optics & Creol University Of Central Florida

• Bernath Robert

  School Of Optics & Creol University Of Central Florida

• Richardson Martin

  School Of Optics & Creol University Of Central Florida

関連論文

• Dynamics of Mass-Limited Laser Plasma Targets as Sources for Extreme Ultraviolet Lithography

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