Plasma in liquid generated by a combination of ultrasonic waves and microwave irradiation

概要

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Plasma chemical vapor deposition (plasma CVD) is a generic term for methods in which a precursor containing a material to be deposited is dissociated in a plasma where it is subject to chemical reactions, and is then deposited as a film on the surface of a heated substrate. A drawback of plasma CVD is that this process cannot be used to synthesize large amounts of adsorbate, or to deposit onto substrates that are vulnerable to high temperatures. As liquids are much denser than gases, synthesis rates are thought to be much higher in the former. The authors have observed the ignition and maintenance of a stable plasma in a liquid hydrocarbon exposed to a combination of ultrasonic waves and microwave radiation. Microwave energy is effectively injected into the interior of acoustic cavitation bubbles, which act as nuclei for the ignition and maintenance of the plasma. Because the plasma is formed in a liquid environment, it is possible to obtain much higher film deposition rates at much lower plasma temperatures than ever before. In addition, this process can be carried out at normal temperatures and pressures.
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