Disappearance of Ohmic Loss Corresponding to Disappearance of Resistance in Very Thin Al Film

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概要

• 論文の詳細を見る

• A very thin Al film of 700 Å or 430 Å thickness was evaporated on an arachidic acid Langumuir-Blodgett film which was deposited on a SiO_2 film present on a silicon wafer substrate. No temperature rise of the very thin Al film was observed in the current range for which the resistance of the very thin Al film disappeared.

• 社団法人応用物理学会の論文
• 2000-05-15

著者

• Hino Taro

  Professor Emeritus Of Tokyo Institute Of Technology

関連論文

• Disappearance of Ohmic Loss Corresponding to Disappearance of Resistance in Very Thin Al Film

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