Residual Stress Analysis of Pt Bottom Electrodes on ZrO_2/SiO_2/Si and SiO_2/Si Substrates for Pb(ZrTi)O_3 Thick Films
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2000-05-15
著者
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No Kwangsoo
Korea Advanced Institute Of Science And Technology
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No Kwangsoo
Korea Advanced Institute Of Science And Technology Department Of Materials Science And Enggineering
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Kim Seong-jin
Micro System Lab. Samsung Advanced Institute Of Technology
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Kim Dong
Yanbian Universty Of Science And Technology Department Of Mechanical And Materials Engineering
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JEON Yongbae
Korea Advanced Institute of Science and Technology, Department of Materials Science and Enggineering
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CHUNG Jaewoo
Micro System Lab. , Samsung Advanced Institute of Technology
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Jeon Yongbae
Korea Advanced Institute Of Science And Technology Department Of Materials Science And Enggineering
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Chung Jaewoo
Micro System Lab. Samsung Advanced Institute Of Technology
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KIM Seong-Jin
Micro System Lab. , Samsung Advanced Institute of Technology
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- Residual Stress Analysis of Pt Bottom Electrodes on ZrO_2/SiO_2/Si and SiO_2/Si Substrates for Pb(ZrTi)O_3 Thick Films
- Resonant Photoemission Spectroscopy and Theoretical Calculation of the Valence Band Structure in Chromium Aluminum Oxynitride
- Electronic Structure Simulation of Chromium Aluminum Oxynitride by Discrete Variational-Xa Method and X-Ray Photoelectron Spectroscopy
- Resonant Photoemission Spectroscopy and Theoretical Calculation of the Valence Band Structure in Chromium Aluminum Oxynitride