A Study of Ion Beam Etching of Polymethylmethacrylate Using N_2 and N_2/O_2-Mixtures

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概要

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• The influence of process parameters such as gas composition, kinetic energy of the ions and sample temperatures was studied in order to discuss the dry etching mechanism of polymers. First, we investigated polymer dry etching using N_2 gas and verified that the heating temperature was the critical parameter in the case of polymer dry etching. Next, polymer dry etching was carried out using N_2-O_2 gas for obtaining smooth vertical side walls. The experimental results revealed that the generation of neutralized reactive species needed to be suppressed to form smooth vertical side walls.

• 社団法人応用物理学会の論文
• 2000-09-15

著者

• Ikeda Masahiro

  Fukuyama University Faculty Of Engineering

• TAGUCHI Kozo

  Fukuyama University, Faculty of Engineering

• Taguchi Kozo

  Fukuyama University Faculty Of Engineering

• UEGUCHI Tomohiko

  Fukuyama University, Faculty of Engineering

• Ueguchi Tomohiko

  Fukuyama University Faculty Of Engineering

関連論文

• Dual-Beam Trapping Method for an Object with Large Relative Refractive Index
• Numerical Computations of the Optical Forces Acting on an Elliptically Shaped Object
• A Study of Ion Beam Etching of Polymethylmethacrylate Using N_2 and N_2/O_2-Mixtures

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