Characterization of an Imaging Extreme-Ultraviolet Flat-Field Spectrometer and Its Application to Extreme-Ultraviolet Emission Profile Measurement

概要

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The spatial imaging property of an extreme-ultraviolet(XUV)flat-field spectrometer was studied using ray-tracing and measured experimentally. Under the condition that the spectrometer is stigmatic at 10 nm, ray-tracing simulations show that the spatial resolution is expected to be about 18μm in the wavelength range from 2.5 nm to 30 nm. The measurement of the spatial resolution, using a wire as fiducial 20 mm away from the source position along the optical axis, was carried out for the CV resonance line(4.03 nm)and a spatial resolution of 70μm was obtained. This value agrees well with the ray-tracing result for a source displaced 20 mm along the optical axis. Using the spatial imaging property of this spectrometer, the emission profiles of CV 1s^2-1s3p(3.50 nm)and CVI L_β(2.85 nm)lines from a laser-produced carbon plasma were measured. The spatial imaging property and Abel inversion were applied to laser-produced carbon plasma spectra to deduce emission profiles.
社団法人応用物理学会の論文
2000-10-15