EB Stepper-A High Throughput Electron-Beam Projection Lithography System

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概要

• 論文の詳細を見る

• The development program of an electron-beam(EB)stepper is under way based on the results of proof of the concept system. Very careful system consideration has been made, because some critical issues have not yet been proven. However, they could be well managed by implementing a new methodology that is introduced by examinimg cach issue from the viewpoint of the basic electron optics principle. In this paper, the practicability and extendability of an EB stepper are discussed and overviewed.

• 社団法人応用物理学会の論文
• 2000-12-30

著者

• Yamaguchi Takeshi

  2nd Development Department Ic Equipment Division Nikon Corporation

関連論文

• EB Stepper-A High Throughput Electron-Beam Projection Lithography System

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