Magnetic Properties of Co/Si(100) Thin Films Studied using Magnetooptic Kerr Effect Technique : Magnetism
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概要
- 論文の詳細を見る
Magnetic properties of cobalt films grown on a Si(100) substrate were investigated using the magnetooptic Kerreff ecttechnique. The longitudinal coercivity for the films with a thickuess range from 2.4 to 17.7 nm is observed to be approximately 55 Oe. The easy axis of magnetization is in the surface plane. Because of silicide formation at the interface and a short absorption length for light in condensed matter, the Kerr intensity is not completely proportional to the film thickness. Thermal evolution for the Co/Si(100) system was systematically investigated. A higher thermal stability is concluded for a thicker cobalt film. At a low temperature, the Kerr intensjty is nearly maintained constant upon annealing treatment. This is expected to be due to the Co-Si compound at the interface blocking further interdiffusion.
- 社団法人応用物理学会の論文
- 2001-12-15
著者
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FU Tsu-Yi
Department of Physics, National Taiwan Normal University
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Fu T‐y
National Taiwan Normal Univ. Taipei Twn
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Fu Tsu-yi
Department Of Physics National Taiwan Normal University
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Tsay Jyh-shen
Department Of Physics Tunghai University
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WU Yueh-Er
Department of Physics, National Taiwan Normal University
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CHEN Shu-Chenms
Department of Physics, National Taiwan Normal University
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SHERN Ching-Song
Department of Physics, National Taiwan Normal University
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Wu Yueh-er
Department Of Physics National Taiwan Normal University
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Chen Shu-chenms
Department Of Physics National Taiwan Normal University
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Shern Ching-song
Department Of Physics National Taiwan Normal University
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