Perturbation Approach for Order Selections of Two-Sided Oblique Projection-Based Interconnect Reductions(<Special Section>VLSI Design and CAD Algorithms)

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概要

• 論文の詳細を見る

• An order selection scheme for two-sided oblique projection-based interconnect reduction will be investigated. It will provide a guideline for terminating the conventional nonsymmetric Pade via Lanczos (PVL) iteration process. By exploring the relationship of the system Grammians of the original network and those of the reduced network, it can be shown that the system matrix of the reduced-order system generated by the two-sided oblique projection can also be expressed as those of the original interconnect model with some additive perturbations. The perturbation matrix only involves bi-orthogonal vectors at the previous step of the nonsymmetric Lanczos algorithm. This perturbation matrix will provide the stopping criteria in the order selection scheme and achieve the desired accuracy of the approximate transfer function.

• 社団法人電子情報通信学会の論文
• 2005-12-01

著者

• Chu Chia‐chi

  National Tsing Hua Univ. Hsin‐chu Twn

• Chu Chia

  Department Of Electrical Engineering Chang Gung University

• Lai Ming

  Department Of Electronic Engineering Chang Gung University

• Feng Wu

  Department Of Electronic Engineering Chang Gung University

• Feng Wu

  Department Of Electrical Engineering Chang Gung University

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