Exposure Atmosphere Effect on PGMA Negative Resist Crosslinking by AlKα X-Ray Exposure

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概要

• 論文の詳細を見る

• The crosslinking retardation of poly (glycidyl methacrylate) (PGMA) has been studied in AlKα X-ray lithography. The exposures were performed in a pressure-controlled exposure chamber, using a 10 kW Al source and polyimide masks. PGMA crosslinking is drastically retarded, as the pressure increases from 1 to 10^4 Pa, by using the mask with a thin gold plating base. It is also shown that PGMA crosslinking is more markedly retarded with longer exposure time, when using this mask.

• 社団法人応用物理学会の論文
• 1981-01-05

著者

• Okada Koichi

  Basic Technology Research Laboratories Nippon Electric Co. Ltd.

関連論文

• Exposure Atmosphere Effect on PGMA Negative Resist Crosslinking by AlKα X-Ray Exposure

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