Threshold Gas Flow Rate of Halide Materials for the Formation of Oxide Particles in the VAD Process for Optical Fiber Fabrication
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1981-04-05
著者
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Sudo Shoichi
Ibaraki Electrical Communication Laboratory Nippon Telegraph And Telephone Corporation
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KAWACHI Masao
Ibaraki Electrical Communication Laboratory, Nippon Telegraph and Telephone Corporation
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EDAHIRO Takao
Ibaraki Electrical Communication Laboratory, Nippon Telegraph and Telephone Corporation
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Kawachi Masao
Ibaraki Electrical Communication Laboratory
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Edahiro Takao
Ibaraki Electrical Communication Laboratory Nippon Telegraph And Telephone Corporation
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Edahiro Takao
Ibaraki Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation
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Kawachi Masao
Ibaraki Electrical Communication Laboratory Nippon Telegraph And Telephone Corporation
関連論文
- Threshold Gas Flow Rate of Halide Materials for the Formation of Oxide Particles in the VAD Process for Optical Fiber Fabrication
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- Field-Induced Nematic-Cholesteric Relaxation in a Small Angle Wedge
- Movable Bubble Domains of Large Pitch Cholesterics
- Nondestructive Structure Measurement of Optical-Fiber Preforms with Photoelastic Effect
- OH-Ion Distribution in Preforms of High-Silica Optical Fiber
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- Hysteresis Behavior of Texture in the Field-Induced Nematic-Cholesteric Relaxation
- Bubble Domain Texture of a Liquid Crystal
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- Light Scattering Properties of a Nematic-Cholesteric Mixture with Positive Dielectric Anisotropy