Surface Composition and Electrochemical Properties of High-Dose Carbon-Implanted Iron

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概要

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• The effect of high-dose C^+ -implantation on the anodic dissolution properties of iron was studied by multisweep cyclic voltammetry in an acetate buffer solution of pH 5.0. Implantation of ^<12>C^+ was performed with a dose of 1×10^<18> ions/cm^2 at an energy of 100 keV. The XPS was used to analyze the depth profile and chemical bonding state of carbon in the surface layers of C^+ -implanted iron. High-dose C^+ -implantation was extremely effective in suppression the anodic dissolution of iron in the solution. The dissolution process is discussed from the depth profiles measured before and after electrochemical treatments.

• 社団法人応用物理学会の論文
• 1990-10-20

著者

• Iwaki Masaya

  Riken

• FUJIHANA Takanobu

  Saitama University

• TAKAHASHI Katsuo

  Saitama University

• SEKIGUCHI Atsushi

  Science University of Tokyo

関連論文

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• Surface Composition and Electrochemical Properties of High-Dose Carbon-Implanted Iron

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