Magnetically Enhanced Reactive Ion Etching of Lead Zirconate Titanate Thin Film by CHF_3 Plasma
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2000-01-15
著者
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Yao Xi
Electronic Materials Research Laoratory, Xi'an Jiaotong University
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Liu Q
Xi'an Jiaotong Univ. Xi'an Chn
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Yao Xi
Electronic Materials Research Laboratory Key Laboratory Of Ministry Of Education Xi'an Jiaotong
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Huang Wei-ning
Institute Of Microelectronics Department Of Electronic Engineering Fudan University
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LIN Yin-yin
Institute of Microelectronics, Department of Electronic Engineering, Fudan University
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LIU Qin
Electronic materials Research Laboratory, Xi'an jiaotong University
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TANG Ting-ao
Institute of Microelectronics, Department of Electronic Engineering, Fudan University
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Tang T‐a
Fudan Univ. Shanghai Chn
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Lin Yin-yin
Institute Of Microelectronics Department Of Electronic Engineering Fudan University
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Liu Qin
Electronic Materials Research Laboratory Xi'an Jiaotong University
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Tang Ting-ao
Institute Of Microelectronics Department Of Electronic Engineering Fudan University
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- Magnetically Enhanced Reactive Ion Etching of Lead Zirconate Titanate Thin Film by CHF_3 Plasma
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