Control of Etch Slope during Etching of Pt in Ar /Cl_2 /O_2 Plasmas

スポンサーリンク

概要

著者

Jung Chan.
Semiconductor Research And Development Center Samsung Electronics Co. Ltd.
YOO Won.
Semiconductor Research and Development Center, Samsung Electronics Co. Ltd.
HAHM Jin.
Semiconductor Research and Development Center, Samsung Electronics Co. Ltd.
KIM Hyoun.
Semiconductor Research and Development Center, Samsung Electronics Co. Ltd.
KOH Young.
Semiconductor Research and Development Center, Samsung Electronics Co. Ltd.
LEE Moon.
Semiconductor Research and Development Center, Samsung Electronics Co. Ltd.
Yoo W
Samsung Electronics Co. Ltd. Kyungki‐do Kor
Yoo Won.
Semiconductor Research And Development Center Samsung Electronics Co. Ltd.
Hahm Jin.
Semiconductor Research And Development Center Samsung Electronics Co. Ltd.
Lee Moon.
Semiconductor Research And Development Center Samsung Electronics Co. Ltd.
Kim Hyoun.
Semiconductor Research And Development Center Samsung Electronics Co. Ltd.
Kim Hyeoung
International Center For Actuators And Transducers Pennsylvania State University
Koh Young.
Semiconductor Research And Development Center Samsung Electronics Co. Ltd.

関連論文

スポンサーリンク