Analysis of Plasma Chemical Reactions in Dry Etching of Silicon Dioxide
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1995-04-30
著者
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Kazumi H
Hitachi Ltd. Ibaraki Jpn
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Kazumi Hideyuki
Energy Research Laboratory, Hitachi, Ltd.
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Tago Kazutami
Energy Research Laboratory, Hitachi, Ltd.
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Tago Kazutami
Energy Research Laboratory Hitachi Ltd.
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Kazumi Hideyuki
Energy Research Laboratory Hitachi Ltd.
関連論文
- Analysis of Plasma Chemical Reactions in Dry Etching of Silicon Dioxide
- Dependence of Binding Energy on the Number of Atoms for Carbon Fullerenes