Real Time Monitoring of NH_3 Concentration Using Diffusion Scrubber Sampling Technique and Result of Application to the Processing of Chemically Amplified Resists

概要

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The application of chemically amplified resist is known to cause a problem in the accurate measurement of the concentration of basic gas species (NH_3, N-methylpyrrolidone (NMP)) in a clean room environment because it is sensitive to its environment. Among various methods of measurement, diffusion scrubber sampling method was selected and tested. The environmental sensitivity of a commercial chemically amplified resist, APEX-E, was also tested. For the concentration measurement, the method proved to be suitable for automation and good for measuring NH_3 concentration as low as the sub ppb level (limit of detection 〜0.08 ppb). Some measurement results concerning various aspects of application are presented. Test results of the environmental stability of chemically amplified resists showed that NH_3 concentration should be controlled to at least under 7.5 ppb for maintaining the process stability.
社団法人応用物理学会の論文
1995-12-30