Pattern Generation below 0.1 micron by Localized Chemical Vapor Deposition with the Scanning Tunneling Microscope

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概要

• 論文の詳細を見る

• Nowadays there are many techniques for nanofabrication, some of which are well established. The scanning tunneting microscope (STM) is the newest tool for making nanostructures, even down to the atomic scale, but it is not yet clear which applications will benefit from it. We have developed a technique that combines STM and chemical vapor deposition (CVD): the idea is to break CVD precursor gases with the electrons from the STM. This has the attractive feature of obtaining the highest resolution possible together with minimal damage to the substrate or existing structures. The gases that have been used with this technique include trimethylaluminum, dimethylcadmium, tungsten hexafluoride, nickel tetracarbonyl, and iron pentacarbonyl. Thus far this technique has produced metallic lines that are only 35 nm wide and dots that are 8 nm in diameter.

• 社団法人応用物理学会の論文
• 1994-12-30

著者

• Lozanne Alex

  Department Of Physics University Of Texas

関連論文

• Pattern Generation below 0.1 micron by Localized Chemical Vapor Deposition with the Scanning Tunneling Microscope

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