Simulation and Process Design of Gray-Tone Lithography for the Fabrication of Arbitrarily Shaped Surfaces

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This paper reports on a study of a methodology for fabrication of arbitrarily shaped silicon structures using technologies common to standard IC manufacturing processes. Particular emphasis is placed on the design and use of halftone transmission masks for the lithography step required in the fabrication process of mechanical, optical orelectronics components. The design and experimental investigation of gray-tone masks were supported by lithography simulation. Results are presented for both simulated gray-tone patterns and experimental trials.
社団法人応用物理学会の論文
1994-12-30