Implementing Attenuated Phase Shift Masks for Contacts in Production

概要

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It has been shown that the attenuated phase shift mask (PSM) is best suited for imaging dark-field patterns(e.g., contacts, vias, and metal lines) when positive photoresists are used. This paper presents our experience and technical data in implementing the attenuated PSM on a contact level in production. Specifically, implementation issues such as mask transmission, mask bias, printing linearity, overlay results, opaque border, mask defects and process latitudes are addressed.
社団法人応用物理学会の論文
1994-12-30