Selective Deposition of Silicon Oxide and Its Application

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概要

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• This paper presents the results of an investigation on selective deposition of silicon oxide using poly-perfluoro-alkylacrylate (PPFAA) which has a significantly low surface energy. Under the condition that silicon oxide film can be deposited on Si, SiO_2 and OFPR resist, no deposition is observed on PPFAA. This technique is successfully applied to the formation of fine patterns having a minimum dimension of 0.1 μm.

• 社団法人応用物理学会の論文
• 1986-01-20

著者

• Arita Yoshinobu

  Ntt Atsugi Electrical Communication Laboratories

• AWAYA Nobuyoshi

  NTT Atsugi Electrical Communication Laboratories

関連論文

• Selective Deposition of Silicon Oxide and Its Application

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