Effect of Various Plasmas on Vacuum Deposited Amorphous and Microscrystal Silicon
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概要
- 論文の詳細を見る
A gaseous plasma of oxygen, nitrogen, hydrogen and air has been used to treat amorphous and microcrystal silicon. The resultant effect, as measured by the photovoltaic characteristics of solar cells made of these materials, is that all of these gases can be effectively incorporated into the amorphous and microcrystal silicon to produce a beneficial photovoltaic effect. There is some difference in thermal stability; nitrogen is very similar to hydrogen and is higher in stability, and oxygen and air are somewhat lower.
- 社団法人応用物理学会の論文
- 1983-03-20
著者
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Kinnier J.h.
Department Of Physics Boston College
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FANG P.H.
Department of Physics, Boston College
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HUAN Zhong
Department of Physics, Boston College
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GAO Yinqun
Department of Physics, Boston College
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SCHUBERT C.C.
Department of Physics, Boston College
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Fang P.h.
Department Of Physics Boston College
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Huan Zhong
Department Of Physics Boston College:(present Address) Department Of Physics Inner Mongolia Universi
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Gao Yinqun
Department Of Physics Boston College:(present Address) Kumming Institute Of Precious Metals Ministry
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Schubert C.c.
Department Of Physics Boston College
関連論文
- Effect of Various Plasmas on Vacuum Deposited Amorphous and Microscrystal Silicon
- Analysis of Crystallization Kinetics of Amorphous PdSi Alloys