Semiconductor Field Ion Micrographs
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概要
- 論文の詳細を見る
Using commercially available wafers, imaging of various semiconductor surfaces was attempted by field ion microscopy (FIM). High quality images were obtained for Si, Ge, GaAs and GaP.
- 社団法人応用物理学会の論文
- 1983-12-20
著者
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Jimbo Akiko
The Institute For Solid State Physics The University Of Tokyo
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Sakata Toyo
The Institute For Solid State Physics The University Of Tokyo
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SAKURAI Toshio
Physics Department, The Pennsylvania State University