Characteristics of Material for Photoresist Spin Coating: Property for Reduction of Photoresist Consumption
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概要
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The spin coating property for the reduction of the photoresist consumption was investigated experimentally using photoresist samples systematically. Dry film thickness D is affected by spin velocity ω: D=kω^<1/2>, where k is a constant. The photoresist samples can be characterized by a constant k irrespective of their composition. The same k photoresist results in the same consumption when the prespin velocity is optimized for reducing the consumption. The consumption is reduced as k becomes smaller. In the case where the prespin velocity is fixed, the consumption becomes smaller for the sample for which the solvent viscosity is small and the solvent evaporation rate is large.
- 社団法人応用物理学会の論文
- 1998-12-01
著者
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Sanada Masakazu
Spinner Fundamental Technology R&d Group Research And Development Department Electronics Equipme
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NAKANO Kayoko
Spinner Fundamental Technology R&D Group, Research and Development Department, Electronics Equipment
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MATSUNAGA Minobu
Spinner Fundamental Technology R&D Group, Research and Development Department, Electronics Equipment
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Nakano Kayoko
Spinner Fundamental Technology R&d Group Research And Development Department Electronics Equipme
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Matsunaga Minobu
Spinner Fundamental Technology R&d Group Research And Development Department Electronics Equipme