Buried Heterostructure GaAs/GaAlAs Distributed Bragg Reflector Surface Emitting Laser with Very Low Threshold (5.2 mA) under Room Temperature CW Conditions
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概要
- 論文の詳細を見る
We would like to report on the performance of buried heterostructure (BH) GaAs/Ga_<0.65>Al_<0.35>As surface emitting (SE) lasers with p-type Ga_<0.9>Al_<0.1>As/Ga_<0.4>Al_<0.6>As and SiO_2/TiO_2 multilayer Bragg reflectors (MBR) under room temperature CW conditins. The buried heterostructure was formed by a selective LPE growth technique with a Ga_<0.55>Al_<0.45>As mask instead of the conventional SiO_2 mask. The GaAlAs mask was very useful for forming uniformly small active regions of about 5 μm in diameter. Under room temperature CW conditions, the threshold current was 5.2 mA. The external differential quantum efficiency was about 16% and more than 0.6 mW of output power was obtained. The Lasing wavelength was about 897 nm.
- 社団法人応用物理学会の論文
- 1989-04-20
著者
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Ishikawa Tohru
Semiconductor Research Center Sanyo Electric Co. Ltd.
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YAMAGUCHI Takao
Semiconductor Research Center, Sanyo Electric Co., Ltd
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Ibaraki Akira
Semiconductor Research Center Sanyo Electric Co. Ltd.
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KAWASHIMA Kenji
Semiconductor Research Center, SANYO Electric Co., Ltd.
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FURUSAWA Kohtaro
Semiconductor Research Center, SANYO Electric Co., Ltd.
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NIINA Tatsuhiko
Semiconductor Research Center, SANYO Electric Co., Ltd.
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Kawashima Kenji
Semiconductor Research Center Sanyo Electric Co. Ltd.
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Niina Tatsuhiko
Semiconductor Research Center Sanyo Electric Co. Ltd.
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Furusawa Kohtaro
Semiconductor Research Center Sanyo Electric Co. Ltd.
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Yamaguchi Takao
Semiconductor Research Center Sanyo Electric Co. Ltd.
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Yamaguchi Takao
Semiconductor Research Center Sanyo Electric Co. Lid.
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- Buried Heterostructure GaAs/GaAlAs Distributed Bragg Reflector Surface Emitting Laser with Very Low Threshold (5.2 mA) under Room Temperature CW Conditions