A Few Techniques for Preparing Conductive Material Films for Sputtering-Type Electron Cyclotron Resonance Microwave Plasma

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1989-03-20

著者

• MATSUOKA Morito

  NTT Opto-Electronics Laboratories, NTT Corporation

• Matsuoka Morito

  Ntt Opto-electronics Laboratories

• Ono Ken'ichi

  Ntt Opto-electronics Laboratories

関連論文

• New Microwave Launcher for Producing ECR Plasmas without Window Contamination I. : Excitation of Electron Cyclotron Wave
• Completely Bi-Substituted Iron Garnet (BIG) Films Prepared by Electron Cyclotron Resonance (ECR) Sputtering
• Preparation of Bi Iron Garnet Film with a Two-Step Growth Technique
• A Few Techniques for Preparing Conductive Material Films for Sputtering-Type Electron Cyclotron Resonance Microwave Plasma
• Stress-Induced Perpendicular Magnetic Anisotropy in PtMnSb Thin Films

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