A New Analytical Model for Spin Coating Process with Solvent Evaporation

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概要

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• The effect of solvent evaporation on the film thickness produced by the spin-coating process is expressed as a function of concentration of solvent. This function is inserted into the equation for the film thickness. The equation obtained gives its analytical solution, which depends on time and the concentration. The concentration is obtained from the diffusion equation. Thus, a more detailed analysis of solvent evaporation becomes possible than before. As an application, the experimental dry film thickness of Jeneckhe is analyzed and a comparison is made with his model.

• 社団法人応用物理学会の論文
• 1987-06-20

著者

• Shimoji Sadao

  Department Of Information Technology Tokyo Engineering University

関連論文

• A New Analytical Model for Spin Coating Process with Solvent Evaporation

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