Small Nb/Al-Oxide/Nb Josephson Junction Fabrication Using Lift-Off Processes

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概要

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• A lift-off technique is applied to the fabrication of all-refractory Nb/Al-oxide/Nb Josephson tunneling junctions. It is found that the lift-off is very efficient for lowering the influence of stresses in refractory metal electrode on junction characteristics. Small junctions (1 μm) with low leakage current can be fabricated by lift-off technique, whereas an etching process increases leakage currents of small junctions. Current-voltage characteristics of Vm=25 mV at a current density of 10 kA/cm^2 and a junction current standard deviation of 3.2% in 1 μm size junctions are obtained.

• 社団法人応用物理学会の論文
• 1987-03-20

著者

• Nakano Jun'ichi

  Ntt Electrical Communications Laboratories

• Kuroda Ken'ichi

  Ntt Electrical Communications Laboratories

• YUDA Masahiro

  NTT Electrical Communications Laboratories

関連論文

• Small Nb/Al-Oxide/Nb Josephson Junction Fabrication Using Lift-Off Processes

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