Orientation of Ni-Cr Thin Films with an Underlying Ti Layer

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概要

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• Insertion of a Ti thin film between an 80 wt% Ni-20 wt% Cr thin film and a glass-coated Al_2O_3 substrate resulted in a strongly (111) preferred orientation in the Ni-Cr thin film, which was deposited on the Ti layer by continuous sputtering. The preferred orientation and the cross section were observed by X-ray diffractometer (XRD) and high-resolution transmission electron microscopy (RRTEM), respectively. The Ni-Cr thin film was found to have a columnar structure and the column axes were normal to the substrate. In addition, the (111) orientation of Ni-Cr was observed to be almost parallel to the (100) orientation of Ti.

• 社団法人応用物理学会の論文
• 1996-03-01

著者

• Nakamura Shin-ichi

  Environmental Engineering Laboratory Toshiba Corporation

• IIDA Atsuko

  Materials and Devices Research Laboratories, Toshiba Corporation

関連論文

• The Study of Initial Mechanism for Al–Au Solid Phase Diffusion Flip-chip Bonding
• Orientation of Ni-Cr Thin Films with an Underlying Ti Layer

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