An Application of Polyphenylsilsesquioxane (PPSQ) to Organic Anti Reflective Coating (ARC)

概要

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A Polyphenylsilsesquioxane (PPSQ) is an inorganic polymer that has a cis-syndiotactic double chain structure [J. F. Brown, Jr.: J. Polym. Sci. 1C (1963) 83]. By mixing a dye that strongly absorbs the i-line with PPSQ in solution, PPSQ obtained by means of conventional spin-coating can be used as an anti reflective coating (ARC). Since the PPSQ ARC has a large absorbance k value, its reflectance depends; little on its thickness, and the thickness uniformity of PPSQ film is superior even if it is formed by spin coating, By using this PPSQ ARC, no reflective notching or linewidth variation of the photoresist pattern are observed.
社団法人応用物理学会の論文
1996-10-01