Application of Penta-Di-Methyl-Amino-Tantalum to a Tantalum Source in Chemical Vapor Deposition of Tantalum Oxide Films

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1991-11-15

著者

• Koshiba Shohei

  Nippon Sanso K.K.

• Uematsu Kunimasa

  Nippon Sanso K.K.

• Uematsu Kunimasa

  Nippon Sanso Corporation Technology Division

• Koshiba Shohei

  Nippon Sanso Corporation Technology Division

• TABUCHI Toshiya

  Nippon Sanso Corporation, Technology Division

• SAWADO Yoshinori

  Nippon Sanso Corporation, Technology Division

• Sawado Yoshinori

  Nippon Sanso Corporation Technology Division

• Tabuchi T

  Nippon Sanso Corporation Technology Division

関連論文

• A New Reactor for Metalorganic Chemical Vapor Deposition Equipped with an Internal Rotary Flow Selector
• Application of Penta-Di-Methyl-Amino-Tantalum to a Tantalum Source in Chemical Vapor Deposition of Tantalum Oxide Films

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