Amorphous Ar Produced by Vapour Deposition

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概要

• 論文の詳細を見る

• Amorphous thin film of Ar has been produced for the first time by the vapour deposition method at 10 K and at a condensation rate of less than 3×10^<-11>m・s^<-1> in ultrahigh vacuum. The electron diffraction pattern shows a diffuse halo, and the vapour pressure is two orders of magnitude larger than that of fcc Ar. The crystallization temperature of a-Ar is 20±1 K.

• 社団法人応用物理学会の論文
• 1990-05-20

著者

• KOUCHI Akira

  Institute of Low Temperature Science, Hokkaido University

• Kouchi Akira

  Institute Of Low Temperature Science Hokkaido University

• Kouchi Akira

  Institute Of Low Temperature Science Hokkaido Univercsity

• KURODA Toshio

  Institute of Low Temperature Science, Hokkaido University

• Kuroda Toshio

  Institute Of Low Temperature Science Hokkaido University

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