Deposition of Diamondlike Carbon Films Using Electron Cyclotron Resonance Plasma Chemical Vapor Deposition from Ethylene Gas

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概要

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• Diamondlike carbon films have been prepared by RF bias electron cyclotron resonance (ECR) microwave plasma deposition from ethylene gas. The relationship between the properties of diamondlike carbon films and process parameters has been investigated. These films were evaluated in terms of Knoop hardness, Raman spectroscopy and hydrogen content measured by an elastic recoil detection analysis (ERDA) method. As the micro-wave power becomes higher, the hardness of the films tends to increase. This trend is different from that observed in the deposition of methane gas.

• 社団法人応用物理学会の論文
• 1995-09-15

著者

• Suzuki Jun-ichi

  Production Engineering Laboratory Shimadzu Corporation

• Okada Shigenobu

  Aircraft Equipment Division Shimadzu Corporation

関連論文

• Deposition of Diamondlike Carbon Films Using Electron Cyclotron Resonance Plasma Chemical Vapor Deposition from Ethylene Gas

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