Sensitivity Improvement of Three Component Resist : Resist and Processes
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1992-04-30
著者
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Ralph Dammel
Hoechst Ag Central Research
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Geoge Pawlowski
Hoechst Ag Central Research
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INOGUCHI Yoshio
Hoechst Japan Ltd
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Inoguchi Yoshio
Hoechst Japan Limited Advanced Technology Laboratories
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NAKAJIMA Yasuhiro
Hoechst Japan Limited, Advanced Technology Laboratories
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Munirathna PADMANABAN
Hoechst Japan Limited, Advanced Technology Laboratories
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KINOSHITA Yoshiaki
Hoechst Japan Limited, Advanced Technology Laboratories
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Winfriend MEIER
Hoechst AG, IC Chemicals Division
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Kinoshita Yoshiaki
Hoechst Japan Limited Advanced Technology Laboratories
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Munirathna Padmanaban
Hoechst Japan Limited Advanced Technology Laboratories
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Winfriend Meier
Hoechst Ag Ic Chemicals Division
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Nakajima Yasuhiro
Hoechst Japan Limited Advanced Technology Laboratories
関連論文
- Three Classes of Chiral Dopants : Synthesis and Physical Qualification as Dopants for Practical FLC-Mixtures : Condensed Matter
- Sensitivity Improvement of Three Component Resist : Resist and Processes