High Performance Resists Tailored for 248 nm Chemical Amplification of Resists Lines Technology : Resist and Processes
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1992-04-30
著者
-
Horst Borndorefer
Siemens Ag Corporate Research And Development
-
Recai SEZI
Siemens AG, Corporate Research and Development
-
Rainer LEUSCHNER
Siemens AG, Corporate Research and Development
-
Christoph NOLSCHER
Siemens AG, Corporate
-
Michael SEBALD
Siemens AG, Corporate Research and Development
-
Hellmut AHNE
Siemens AG, Corporate Research and Development
-
Siegfried BIRKLE
Siemens AG, Corporate Research and Development
-
Recai Sezi
Siemens Ag Corporate Research And Development
-
Hellmut Ahne
Siemens Ag Corporate Research And Development
-
Michael Sebald
Siemens Ag Corporate Research And Development
-
Rainer Leuschner
Siemens Ag Corporate Research And Development
-
Siegfried Birkle
Siemens Ag Corporate Research And Development
-
Christoph Nolscher
Siemens Ag Corporate